Principle of Interface Reaction Polishing

Whether it is Dry media reaction or hydration reaction, the local reaction products at the interface caused by the contact friction between two objects can be removed by the machinery generated by friction for processing.

In this form of machining, the interface reaction will not pose any threat to the Hardness of the tool. Therefore, materials softer than the workpiece can be used as the processing medium, which makes it possible to achieve non-destructive surface processing, such as mechanochemical polishing.

When using interface reaction for processing, the processing medium can be reactive powder, reactive solid surface, or liquid. The reaction products can be easily removed from the surface of the workpiece using mechanical energy. Every time the workpiece is completely removed, the surface of the workpiece correspondingly recedes by about 5nm (the depth of the reaction layer is about 5nm). Repeat this step on the workpiece surface, and the protruding parts of the workpiece surface gradually become smooth. From the perspective of the processing unit, an ultra precision surface with a surface roughness of several nanometers or less can be processed, which is called interface reaction polishing.

In mechanochemical polishing using Dry media reaction, the processing medium usually uses appropriate reactive powder. This is mainly to achieve the interface reaction through the high Thermodynamic activity of the powder and the high contact rate of the workpiece surface. Therefore, the mechanical chemical polishing device is the same as the conventional polishing device.

In hydration polishing, the water used as the processing medium is pure water, which can avoid surface contamination caused by the processing medium. Therefore, this type of processing is also known as clean processing.

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